Chemical and physical sputtering effects on the surface morphology of carbon films grown by plasma chemical vapor deposition
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Evaluation of the Effect of Ni-Co NPs for the Effective Growth of Carbon Nanotubes by TCVD System
A systematic study was conducted to understand the influences of catalyst combination as Ni-Co NPs on carbon nanotubes (CNTs) grown by Chemical Vapor Deposition (TCVD). The DC-sputtering system was used to prepare Co and Ni-Co thin films on silicon substrate. Ni- Co nanoparticles were used as metal catalyst for growing carbon nanotubes from acetylene (C2H2) gas in 850 ̊ C during 15 min. Carb...
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